Course description: The course will cover the fabrication process and the inspection techniques of semiconductors. It is an introduction to the fundamentals of micro- and nano-fabrication processes with emphasis on cleanroom practices. It will cover: 1) The physical principles of optical lithography, electron-beam lithography, alternative nanolithography techniques, and thin film deposition and metrology methods; 2) The physical and chemical processes of wet and dry etching; 3) Cleanroom concepts and safety protocols; 4) Sequential micro-fabrication processes involved in the manufacture of microelectronic and photonic devices; 5) Metrology, imaging and characterization of micro- and nano-structures; and 6) Examples of practical existing and emerging micro- and nano-devices. Emphasis will be hands-on learning, and 50 % of the contact hours will lab sessions. Students divided in small groups will use the tools and equipment at the Toronto Nanofabrication Centre (TNFC) and the Open Centre for the Characterization of Advanced Materials (OCCAM). This is a graduate-level technical course which can be used by M Eng, MASc, and PhD students towards their degree requirements in MSE and ECE. Due to the limitation of lab space, enrolment is capped at 30. Arrangement of contact hours: 2 lecture hours every week and 4 lab hours bi-weekly. Textbooks: [1] Fundamentals of Microfabrication, Marc J. Madou, 2nd edition, CRC Press, ISBN 9781315274225, 2018. [2] Microlithography Science and Technology, Edited By Bruce W. Smith, Kazuaki Suzuki, 3rd edition, CRC Press, ISBN 9781032836737, 2024.