Graduate Courses: Fall 2018


  • Most formal classes begin the week of September 10, 2018

MSE1022 HF—Special Topics in Materials Science I: Material Assemblages

Instructor: G. Hibbard
Lectures, room BA-BO26: Wednesdays (5:00 – 7:00)

This course tackles the question of understanding materials systems in general. We begin by defining a multi-scaled framework of material assemblages: first at the level of nuclide (nuclear physics), then at the level of molecule (chemistry), then upwards to the ultra-molecular.

Of the three, it is the ultra-molecular that is the least formalized and for it we look to define a framework of material information. Our starting point is the crystal physics of Nye [Nye, 1957], which offers an analytical framework for considering reversible material thermodynamics and provides a complete tensorial description of energetic inputs.

Reversible thermodynamics, however, represents only a very limited range of material behavior and different conceptual tools are needed to consider the more interesting thermodynamically irreversible material phenomena. Irreversible material dynamics unfold over a multiplicity of organizational scales and model systems are necessary for illustrating these changes. First we start with those material systems occupying the intersectionality between simplest molecular configuration and greatest extent of physical understanding.

We then move on to look at the question of relative material complication in several steps. First in the hard condensed materials and then in the soft condensed materials. We look at why one type of system is more difficult to model than another. We will also address the hypothetical question of limiting material complication: what is the most complicated a material system can be? Student projects will be assigned as case studies examining more detailed aspects of these questions.

Prerequisite: None
Course Text: Selected Readings
Minimum Enrollment: 5

MSE1023 HF—Special Topics in Materials Science II: Electron Transport in Quantum Nanostructures

Instructor: H. Ruda
Lectures, room BA2139: Wednesdays (3:00 – 5:00)

The course will provide an introduction to the primary transport mechanisms in quantized semiconductor nanostructures. This includes tunnelling, Coulomb blockade, ballistic and wavelike transport. Students will also be introduced to fabrication methodologies, and the focus will be on low dimensional systems—particularly, quantum dots and wires.

Prerequisite: —
Course Text: —
Minimum Enrollment: 5

MSE1026 HF—Analytical Electron Microscopy

Instructor: D.D. Perovic
Lectures, room MY480: NEW DAY – Monday  (5:00 – 7:00)

A course covering both introductory and advanced topics in scanning and transmission electron microscopy including:  Instrumentation; Electron Scattering Fundamentals; Electron Diffraction Techniques; Diffraction Contrast Imaging; High Resolution TEM; SEM Imaging Techniques; Energy Dispersive X-ray Spectrocsopy; Electron Energy-Loss Spectroscopy; and, Advance SEM Techniques.  All topics will be presented using a range of materials science examples for all classes of materials. 

Prerequisite: — 
Course Text:  “Transmission Electron Microscopy”, D.B. Williams and C. B. Carter Plenum Press, NY, 1996 
Minimum Enrollment: 5

MSE1028 HF—Advanced Materials Science: Thin Film Materials and Processing

Instructor: Z.H. Lu
Lectures, room BA2155: Mondays (1:00- 3:00)

The course will focus on Materials Science of Thin Films. The textbook by Milton Ohring, “The Materials Science of Thin Films” (Academic Press, 1992 Toronto), will be used as the main learning material. The following topics may be covered: Brief Review of Materials Science; Vacuum Science and Technology; Physical Vapor Deposition; Chemical Vapor Deposition; Film Formation and Structure; Characterization of Thin Films; Interdiffusion and Reactions in Thin Films; Electrical and Magnetic Properties of Thin Films; Optical Properties of Thin Films; Emerging Thin-Film Materials and Applications (molecular thin-films and devices). The course is offered to graduate students whose research is related to organic light emitting diodes.

Prerequisite:  Advanced Physics & Advanced Nanoscience                                
Course Text:  The Materials Science of Thin Films by Milton Ohring, Academic Press, Toronto, 1992
Minimum Enrollment:  5

MSE1036 HF—Application of Electrochemical Techniques in Materials Science

This course will be offered September 10 – 14

Instructor: S. Thorpe
Lectures, room WB139: 9:00 – 12:00 (every day)
Labs, room MB209: 1:00 – 4:00 (every day)

This course covers both the fundamental aspects of techniques used to assess electrochemical reactions (cell potential, current distribution, analytical electrochemistry), their mechanisms from a materials perspective (electrocatalysis, general and localized corrosion, energy systems) with an additional emphasis on in-class laboratory practice in specimen preparation, utilization of electrochemical equipment, analysis of electrochemical data and their link to structure-property relationships in materials. Experimental methods will cover d.c. electrochemical techniques such as cyclic open circuit potential measurements, cyclic potentiodynamic anodic polarization, cyclic voltammetry, chronopotentiometry, chronoamperometry, and a.c. techniques such as electrochemical impedance spectroscopy.   Throughout the course, examples of the application of principles and techniques to the development of novel materials for a variety of applications will be highlighted.


  • MSE 315 or equivalent (electrochemical or corrosion courses)
  • Consultation with instructor prior to enrolment strongly recommended
  • Successful completion of Safety Training in accordance with the MSE Graduate Requirements to undertake research

Course Text: TBA
Minimum Enrollment: 5
Maximum Enrollment: 16

MSE1037 HF—Process Metallurgy of Iron and Steel

Instructor: K. Chattopadhyay
Lectures, room SS1072: Tuesdays (6:00 – 8:00)
Tutorials, room GB404: Mondays (6:00 – 7:00)

The production and refining of liquid iron in the iron blast furnace, the production and refining of liquid steel, secondary refining operations, continuous casting and thermomechanical processing (hot rolling). Specialty steels and newly emerging technologies (e.g. thin slab casting, direct ironmaking) are also discussed in terms of process/environment and productivity. “Downstream” topics will include cold rolling, batch and continuous annealing, and coating operations.

Prerequisite: knowledge of thermodynamics      
Exclusion: MSE437                          
Course Text: TBA
Minimum Enrollment: 5

MSE1038HF Computational Materials Design (formerly MSE1032 Atomistic Modelling of Materials)

Instructor: C.V. Singh
Lectures: room MY380: Wednesdays (4:00 – 6:00), & Fridays (4:00 – 5:00)
Labs: room SF1013: Tuesdays (12:00 – 2:00)

In this course, graduate students will be taught the theory and application of computer modeling of materials at the atomic scale. Specific topics include: classical and modern first principles atomistic modeling approaches, statistical mechanics, molecular statics and dynamics, density functional theory and kinetic Monte Carlo sampling. The approximations, advantages and limitations involved with each approach will be highlighted. A significant focus of the course will be to provide a “hands-on” training on these computational techniques through software such as LAMMPS, GROMACS and Quantum-Espresso. To illustrate computational modeling research, a number of practical case studies from advanced materials and nanotechnology will be highlighted. The course will also include an individual or group project. Some advanced topics, such as accelerated molecular dynamics, multiscale modeling, coarse-graining approaches and DFT+U will also be introduced.

Students from diverse fields of study are welcome to attend the course. A number of approaches and case studies from hard materials as well as polymers and biological systems will be covered. Projects from diverse research areas are also encouraged.

Prerequisite:  Graduate level understanding of Materials Science; basic knowledge of MATLAB or any programming language.     
Exclusion: MSE1032, MSE438
Course Text: TBA
Minimum Enrollment:  5
Maximum Enrollment: 20 (approx.)